Autor:	V. P. Smirnov, T. V. Tomila, L. D. Dyubova, V. A. Lavrenko, L. P. Isayeva, M. V. Vlasova
Rok vydání:	1999
Předmět:	Materials science Silicon Magnesium Metallurgy chemistry.chemical_element Electron microprobe Atmospheric temperature range Nitride chemistry.chemical_compound chemistry Silicon nitride General Materials Science Nitriding Titanium
Zdroj:	Journal of Materials Synthesis and Processing. 7:151-157
ISSN:	1064-7562
DOI:	10.1023/a:1021865112564
Popis:	The nitriding of titanium–magnesium production waste containing chlorine was studied using X-ray, IR, EPR, and EPMA techniques as well as chemical and mass spectrometry analyses. It was established that the high-dispersion system, consisting mainly of silicon nitride and oxinitride, formed in the temperature range of 1273–1673 K. The complex defective structure of initial silicon particles and their size determine the mechanism of nitriding and phase composition of the product formed. The base of this mechanism is the formation of free Si— and Si— bonds.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0ff750797e3bd00b878784f71834e7b8 https://doi.org/10.1023/a:1021865112564 Zobrazit plný text záznamu Full text from SpringerLink