| Autor: | Shojiro Kawakami, Chiharu Takahashi, Toshiaki Tamamura, Masaya Notomi, E. Kuramochi, Takayuki Kawashima, Jun-ichi Takahashi |
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| Rok vydání: | 2002 |
| Předmět: |
Fabrication
Materials science business.industry Photonic integrated circuit Physics::Optics Yablonovite Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Photonic metamaterial Nanolithography Optics Optoelectronics Electrical and Electronic Engineering Photonics business Electron-beam lithography Photonic crystal |
| Zdroj: | Optical and Quantum Electronics. 34:53-61 |
| ISSN: | 0306-8919 |
| DOI: | 10.1023/a:1013326610166 |
| Popis: | We propose two photonic crystal structures that can be created by combining nanolithography with alternating-layer deposition. Photonic band calculations suggest that a drilled alternating-layer photonic crystal combining two-dimensional (2D) alternating multilayers and an array of vertically drilled holes may achieve a full photonic bandgap. In addition, a 3D/2D/3D cross-dimensional photonic crystal, which sandwiches a 2D photonic crystal slab between three-dimensional (3D) alternating-layer photonic crystals, should provide better vertical confinement of light than a conventional index guiding slab. Fabrication techniques based on existing technologies (electron beam lithography, bias sputtering, and low-pressure ECR etching) require very few process steps. Our preliminary fabrication suggests that, by refining these technologies, we will be able to realize photonic crystals. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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