In Situ ATR−FTIR Analysis of Surfactant Adsorption onto Silicon from Buffered Hydrofluoric Acid Solutions
| Autor: | Roger P. Sperline, Srini Raghavan, Marcia Almanza-Workman |
|---|---|
| Rok vydání: | 2000 |
| Předmět: |
Silicon
Chemistry Inorganic chemistry Analytical chemistry Infrared spectroscopy chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Absorbance chemistry.chemical_compound Adsorption Hydrofluoric acid Pulmonary surfactant Desorption Electrochemistry General Materials Science Fourier transform infrared spectroscopy Spectroscopy |
| Zdroj: | Langmuir. 16:3636-3640 |
| ISSN: | 1520-5827 0743-7463 |
| DOI: | 10.1021/la991200v |
| Popis: | Buffered hydrofluoric acid (BHF) solutions containing HF and NH4F are widely used in the manufacturing of silicon-based integrated circuits. The adsorption/desorption characteristics of a commercially available, high purity, polyglycidol type surfactant (OHS) onto/from silicon from buffered hydrofluoric acid (BHF) solutions was studied by in situ attenuated total reflection−Fourier transform infrared spectroscopy (ATR−FTIR). The challenge in these measurements was to resolve the C−H peaks, in the 2800−3000 cm-1 region of the surfactant spectrum, that were masked by the strong absorbance due to N−H caused by a large amount of NH4+ ions in the solution. A technique has been developed to overcome this limitation. The principle of this technique is to carry out the surfactant adsorption in BHF solutions followed by the replacement of NH4+ ions by alkali-metal cations, such as K+ and Cs+, to allow better resolution of the C−H peaks from the baseline. Extrapolation of the adsorption density to time zero yields ... |
| Databáze: | OpenAIRE |
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