The effect of process parameters on the chemical structure of pulsed laser deposited carbon nitride films
| Autor: | Eric Fogarassy, Tamás Szörényi, F. Antoni, I. Bertóti |
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| Rok vydání: | 2002 |
| Předmět: |
Excimer laser
Mechanical Engineering medicine.medical_treatment Analytical chemistry chemistry.chemical_element General Chemistry Nitride Nitrogen Fluence Electronic Optical and Magnetic Materials Pulsed laser deposition chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Materials Chemistry medicine Electrical and Electronic Engineering Thin film Carbon nitride |
| Zdroj: | Diamond and Related Materials. 11:1157-1160 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/s0925-9635(01)00558-1 |
| Popis: | Results of a comparative XPS study on 26 carbon nitride samples of different chemical composition fabricated by ablating a graphite target with an ArF excimer laser in N2 atmosphere while systematically varying the pressure in the 1–100-Pa and the laser fluence in the 1.0–10-J cm−2 domains are reported. N1s core level spectra recorded on all samples are consistently fitted by four components at 398.2, 399.4, 400.7 and 402.1 eV, respectively. Changes in the relative abundance of the individual spectral components of the N1s lines as a function of laser fluence and nitrogen pressure are interpreted in terms of changes in the chemical environment around nitrogen atoms. When present in low concentration, nitrogen atoms prefer sites allowing pyramidal configuration. With increasing concentration more and more atoms form CNC type bonds, nevertheless, in all films the majority of the nitrogen atoms occupies pyramidal configurations. |
| Databáze: | OpenAIRE |
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