Proton NMR Determination of Miscibility in a Bulk Model Photoresist System: Poly(4-hydroxystyrene) and the Photoacid Generator, Di(tert-butylphenyl)Iodonium Perfluorooctanesulfonate

Autor:	Vivek M. Prabhu, David L. VanderHart, Eric K. Lin
Rok vydání:	2004
Předmět:	chemistry.chemical_classification Materials science General Chemical Engineering Relaxation (NMR) General Chemistry Polymer Photoresist Miscibility chemistry.chemical_compound chemistry Polymer chemistry Materials Chemistry Spin diffusion Proton NMR Physical chemistry Polystyrene Spectroscopy
Zdroj:	Chemistry of Materials. 16:3074-3084
ISSN:	1520-5002 0897-4756
DOI:	10.1021/cm030130h
Popis:	The intimacy of component mixing in solvent-cast blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(tert-butylphenyl)iodonium perfluorooctanesulfonate (PFOS) were studied by solid-state proton NMR. These are simplified blends for chemically amplified photoresist formulations used in the micro-electronics industry. Multiple-pulse NMR techniques are used in both spin-diffusion and longitudinal relaxation experiments at ambient temperatures. It is deduced that PFOS is mixed with PHS on a molecular scale for the mass-ratio range investigated, namely, 91/9 to 55/45 PHS/PFOS; hence, the two components are thermodynamically miscible in this range. Control experiments involving a 91/9 physical mixture of PHS and PFOS as well as solvent-cast blends of polystyrene (PS) and PFOS serve to illustrate the contrast between data obtained for phase-separated blends and data for blends that display molecular level mixing. An attempt was also made to support the notion of intimate PFOS/PHS mixing by ...
Databáze:	OpenAIRE
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