48.2: New Formation of Multi‐layered n+ Silicon Films Using Four‐mask process Architecture for Image Sticking Improvement in 32‐inch TV Product

Autor:	James Hsu, Zhen Liu, Qiong-hua Mo, York Lu, Kai-jun Liu, An-Thung Cho, Wade Chen, Feng-yun Yang
Rok vydání:	2019
Předmět:	Materials science Silicon chemistry business.industry Product (mathematics) Optoelectronics chemistry.chemical_element Process architecture business Image (mathematics)
Zdroj:	SID Symposium Digest of Technical Papers. 50:544-548
ISSN:	2168-0159 0097-966X
DOI:	10.1002/sdtp.13556
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0ed39f4148c513e56e66c06915108b39 https://doi.org/10.1002/sdtp.13556 Zobrazit plný text záznamu Plný text