(tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors

Autor:	David Zanders, Matthew B. E. Griffiths, Seán T. Barry, Jason D. Masuda, Anjana Devi, Michael A. Land
Rok vydání:	2021
Předmět:	Thermogravimetric analysis Crystallography Atomic layer deposition Chemistry Ligand Process development Surfaces and Interfaces Condensed Matter Physics 3. Good health Surfaces Coatings and Films
Zdroj:	Journal of Vacuum Science & Technology A. 39:032409
ISSN:	1520-8559 0734-2101
Popis:	Eight new atomic layer deposition (ALD) precursors were synthesized using a ligand that is new to the field of ALD: (tBuNH)SiMe2NMe2. Complexes containing Mg, V, Mn, Fe, Co, Ni, and Zn were found to be tetrahedral, and Li complexes form more complex structures. These compounds performed exceptionally well by thermogravimetric analysis (TGA). All compounds except for one Li species and the Fe complex left residual masses below 5%, similar or better than the analogous amidinate complexes. In particular, the Co(II) complex is very thermally robust and performs very well during a TGA stress test, surpassing temperatures above 200 °C. These compounds are the first of a family of precursors containing this type of monoanionic N–Si–N ligand and are prime candidates for ALD process development.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0ebffefefbf8cddcc9c213a802842721 https://doi.org/10.1116/6.0000795 Zobrazit plný text záznamu