| Autor: |
Leonardus H. A. Leunissen, D. E. Hardy, Marylyn Hoy Bennett, Andrew Grenville, Theodore M. Bloomstein, Scott D. Hector, Mordechai Rothschild, James N. Hilfiker, Shane R. Palmer, Vicky Philipsen |
| Rok vydání: |
2005 |
| Předmět: |
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| Zdroj: |
Optical Microlithography XVIII. |
| DOI: |
10.1117/12.600098 |
| Popis: |
Polarization dependent diffraction efficiencies in transmission through gratings on specially designed masks with pitch comparable to the wavelength were measured using an angle-resolved scatterometry apparatus with a 193 nm excimer source. Four masks - two binary, one alternating and one attenuated phase shift mask - were included in the experimental measurements. The validity of models used in present commercially available simulation packages and additional polarization effects were evaluated against the experimental scattering efficiencies. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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