| Popis: |
During this third quarter effort has been directed toward the characterization of a series of thin films prepared during the first half of this contract in which the primary variable parameters are the total gas pressure (Ar + H/sub 2/ as expressed in mTorr) and partial pressure of hydrogen (as expressed as a percentage of the total gas pressure). The comprehensive characterization of the structure, composition and properties is reported for the following: deposition rate, density, internal stress measurements, and high energy ion beam annealing effects. (WHK) |
