Long afterglow characteristics of thin film phosphor fabricated by laser ablation

Autor: Takitaro Morikawa, Hiroaki Aizawa, Toru Katsumata, Xinwei Zhao, S. Komuro, K. Sato, Susumu Harako
Rok vydání: 2005
Předmět:
Zdroj: Journal of Crystal Growth. 275:e1137-e1141
ISSN: 0022-0248
DOI: 10.1016/j.jcrysgro.2004.11.203
Popis: Long afterglow phosphorescent SrAl 2 O 4 :Eu,Dy thin films have been fabricated on Si substrate by laser ablation. The thin film phosphors show the intense green emission near 520 nm, and additional emissions near 390 nm and near 450 nm that are originating from 5d–4f transition in Eu 2+ Eu 2 + ions doped in the thin films. The afterglow intensity at 520 nm of the thin film phosphors was detected over 20 min later, after excitation was removed. The afterglow characteristics is almost the same between in the SrAl 2 O 4 :Eu,Dy thin film phosphors and the SrAl 2 O 4 :Eu,Dy bulk phosphors. Then, the long afterglow characteristics are interpreted by the hole trapping due to the Dy 3+ Dy 3 + ions added as the auxiliary activator doped into the SrAl 2 O 4 thin films.
Databáze: OpenAIRE