| Popis: |
Three-color lithography (3CL) produces features on the scale of tens of nanometers using visible light. In this technique, one beam pre-activates a photoresist, a second beam deactivates it, and a third beam activates the pre-activated regions that have not been deactivated. The deactivation beam trims features, allowing for improved feature size and resolution. Creating permeable thin films enables us to further control feature size using oxygen as a quencher. We will discuss these thin-film studies, which are a promising step towards large-area patterning. |
