Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model
| Autor: | J.-N. Chazalviel, C. Henry de Villeneuve, François Ozanam, Philippe Allongue, Dorin Dusciac |
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| Rok vydání: | 2013 |
| Předmět: |
chemistry.chemical_classification
Silicon Thermal decomposition Enthalpy Infrared spectroscopy chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Surfaces Coatings and Films Fragmentation (mass spectrometry) chemistry Monolayer Materials Chemistry Alkoxy group Physical chemistry Organic chemistry Alkyl |
| Zdroj: | Surface Science. 609:230-235 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/j.susc.2012.12.008 |
| Popis: | A recent spectroscopic study showed that alkoxy monolayers grafted on a (111) silicon surface thermally decompose in the 200–400 °C range by fragmentation of the alkyl chains [Surf. Sci. 601 (2007) 3961]. Here this behavior is reproduced by a numerical simulation, assuming that the elementary fragmentation steps have different probabilities, depending on the length of the fragments formed. The variation of the CH 2 /CH 3 ratio, as determined experimentally by infrared spectroscopy, is reproduced with a set of fragmentation probabilities consistent with the enthalpy variation associated with each corresponding step. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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