Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper For VLSI Processing
| Autor: | James H. Bennewitz, Tanya E. Jewell, Darryl W. Peters, Victor Pol |
|---|---|
| Rok vydání: | 1987 |
| Předmět: |
Materials science
Excimer laser business.industry Extreme ultraviolet lithography medicine.medical_treatment Condenser (optics) General Engineering Atomic and Molecular Physics and Optics law.invention Numerical aperture Optics law medicine Optoelectronics Stepper Photolithography business Lithography Next-generation lithography |
| Zdroj: | Optical Engineering. 26:264311 |
| ISSN: | 0091-3286 |
| DOI: | 10.1117/12.7974072 |
| Popis: | A deep-ultraviolet step-and-repeat system, operating at 248.4 nm, has been developed by retrofitting a commercial lithography tool with a KrF excimer laser and custom designed, fused silica condenser and projection optics. It is a reduction system with a field size of 14.5 mm and a variable numerical aperture of 0.20 to 0.38. Resolution of 0.5 µm features over the full field is obtained with routine use, and 0.35 µm resolution is attainable under more limited conditions. This paper describes the development and testing of the system, including recent modifications, and discusses some of the technical issues associated with short wavelength excimer laser based lithography. |
| Databáze: | OpenAIRE |
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