Synthesis of AlN Thin Films by ECR Microwave Plasma Sputtering Method

Autor:	Yoshimasa Kumashiro, Eiji Kamijo
Rok vydání:	1993
Předmět:	Materials science business.industry Sputtering Optoelectronics Electrical and Electronic Engineering Thin film Condensed Matter Physics business Ion source Surfaces Coatings and Films
Zdroj:	SHINKU. 36:353-356
ISSN:	1880-9413 0559-8516
DOI:	10.3131/jvsj.36.353
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0dde10a61b0a2f4ceeb86204bc65ca87 https://doi.org/10.3131/jvsj.36.353 Zobrazit plný text záznamu