Development of elastic polishing materials for the process of chemical-mechanical planarization

Autor:	D. I. Terashkevich, E. S. Bokova, G. M. Kovalenko
Rok vydání:	2023
Předmět:	Polymers and Plastics Chemical Engineering (miscellaneous)
Zdroj:	Plasticheskie massy. :44-48
ISSN:	0554-2901
DOI:	10.35164/0554-2901-2023-3-4-44-48
Popis:	The paper presents the results of the development of conditions for the production of elastic polishing materials based on solutions of polyethyruretanes, for the chemical-mechanical planarization of semiconductor silicon wafers.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0dd512aed1cac616a64f8a0eb8b25fa8 https://doi.org/10.35164/0554-2901-2023-3-4-44-48 Zobrazit plný text záznamu