| Autor: |
Tejaswi K. Indukuri, John J. Plombon, Alan Myers, Mauro J. Kobrinsky, Narendra Lakamraju, Kevin L. Lin, Kanwal Jit Singh, Hui Jae Yoo, Jacob Faber, Christopher J. Jezewski, M. Harmes, B. Krist, James S. Clarke, Ramanan V. Chebiam, Hazel Lang, Colin T. Carver |
| Rok vydání: |
2014 |
| Předmět: |
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| Zdroj: |
IEEE International Interconnect Technology Conference. |
| Popis: |
A sidewall planar capacitor (SW CAP) vehicle is developed to closely simulate processing conditions for metal barrier and dielectric in an integrated structure. For a known tantalum barrier for copper on a low-K dielectric, SW CAP TDDB is similar to those measured on an integrated vehicle. SW CAP results are useful for comparing electrical reliability of different dielectric systems, and effective in determining physical continuity of copper metal barriers. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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