Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma

Autor:	Jong-Chang Woo, Dong-Pyo Kim, Gwan-Ha Kim
Rok vydání:	2022
Předmět:	Electrical and Electronic Engineering Electronic Optical and Magnetic Materials
Zdroj:	Transactions on Electrical and Electronic Materials. 23:569-577
ISSN:	2092-7592 1229-7607
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0d82773b15c2593825f088418e33d0ce https://doi.org/10.1007/s42341-022-00408-6 Zobrazit plný text záznamu Full text from SpringerLink