Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns
| Autor: | Pengfei Guo, David Lombardo, Piyush Shah, Andrew Sarangan |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Pixel business.industry Extreme ultraviolet lithography 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Interference lithography law.invention 010309 optics Optics law 0103 physical sciences Optoelectronics X-ray lithography Photolithography 0210 nano-technology business Lithography Next-generation lithography Maskless lithography |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2219484 |
| Popis: | Pixelated wiregrids are of great interest in polarimetric imagers, but there are no straightforward methods available for combining the uniform exposures of laser interference with a masking system to achieve pixels at different rotational angles. In this work we demonstrate a 266nm deep-UV interference lithography combined with a traditional i-line contact lithography to create such pixels. Aluminum wiregrids are first made, following by etching to create the pixels, and then a planarizing molybdenum film is used before patterning subsequent pixel arrays. The etch contrast between the molybdenum and the aluminum enables the release of the planarizing layer. |
| Databáze: | OpenAIRE |
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