Analysis on influence of slit setting in monochromator wavelength calibration

Autor:	Li Jian-Jun, Xie Chenyu, Gao Fang, Zhai Wenchao
Rok vydání:	2019
Předmět:	Optics Materials science law business.industry business Slit Atomic and Molecular Physics and Optics Wavelength calibration Monochromator law.invention
Zdroj:	Journal of Applied Optics. 40:93-97
ISSN:	1002-2082
DOI:	10.5768/jao201940.0103003
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0cf8c3dd8cbc0699d2d430ce8559a6a2 https://doi.org/10.5768/jao201940.0103003 Zobrazit plný text záznamu