Stress-induced wrinkling of sputtered SiO2 films on polymethylmethacrylate

Autor:	David G. Cahill, Qinqin Xu, Justin R. Serrano
Rok vydání:	2006
Předmět:	Stress (mechanics) Materials science Sputtering Surface roughness Deposition (phase transition) Surfaces and Interfaces Sputter deposition Composite material Thin film Condensed Matter Physics Nanoscopic scale Layer (electronics) Surfaces Coatings and Films
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:324-327
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.2171711
Popis:	Compressively stressed SiO2 films are deposited by rf magnetron sputtering onto polymethylmethacrylate- (PMMA) coated Si substrates. The oxide film roughens by wrinkling during deposition; wrinkling is enabled by the viscous flow of the PMMA layer. The nanoscale lateral length scale of the wrinkling, ∼120nm, is established during the first few nanometers of film deposition and is controlled by the thickness and stress of the SiO2 film at the onset of the instability. Continued deposition of SiO2 leads to a rapid increase and then saturation of the rms roughness at ∼5nm.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0cd7410d7775979bc1c2a510477ed378 https://doi.org/10.1116/1.2171711 Zobrazit plný text záznamu