Microprobe RBS analysis of localized processed areas by FIB etching and deposition

Autor:	J. Tajima, M. Takai, T. Ochiai, Y.K. Park, Ryo Mimura
Rok vydání:	2001
Předmět:	Nuclear and High Energy Physics Surface coating Microprobe Ion beam deposition Etching (microfabrication) Chemistry Analytical chemistry Chemical vapor deposition Instrumentation Focused ion beam Fluence Microanalysis
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 181:335-339
ISSN:	0168-583X
DOI:	10.1016/s0168-583x(01)00491-8
Popis:	Localized beam-processed areas using chemical reactions induced by a 30 keV Ga + focused ion beam (FIB) with and without I2 (etching) and (CH3)3CH3C5H5Pt gases (Pt deposition) have been analyzed using a 300 keV Be 2+ microprobe with a beam spot size of 50–80 nm. The analyzed results have been compared with energy dispersive X-ray (EDX) analysis using an electron beam. The EDX analysis only indicated incorporated impurities at high fluence such as Ga, Pt and C, while microprobe RBS analysis could detect residual iodine with low concentration which couldn't be detected by EDS analysis because of the lower sensitivity of the EDX analysis for heavy atoms.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0ccf2ed3ab6013ec8c79ff6682a899ed https://doi.org/10.1016/s0168-583x(01)00491-8 Zobrazit plný text záznamu Full Text from ScienceDirect