Low-temperature oxygen plasma treatment of single-layer molybdenum disulfide
| Autor: | Quan Wang, Anthony Akayeti, Weibing Zhang, Xiaohong Yan |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Polymers and Plastics Stripping (chemistry) Metals and Alloys Analytical chemistry Surface finish Adhesion Surfaces Coatings and Films Electronic Optical and Magnetic Materials Biomaterials Root mean square chemistry.chemical_compound symbols.namesake chemistry Surface roughness symbols Adhesive Raman spectroscopy Molybdenum disulfide |
| Zdroj: | Materials Research Express. 6:055007 |
| ISSN: | 2053-1591 |
| Popis: | Two-dimensional (2D) molybdenum disulfide (MoS2) is considered a promising candidate for next-generation electronic devices because of its non-zero band-gap, mechanical flexibility, and optical transparency. In this study, the structural, mechanical, and surface potential characteristics of single-layer MoS2 films subjected to oxygen plasma treatment were investigated. Comparison of the Raman spectra of single-layer MoS2 films before and after plasma treatment revealed that plasma treatment caused mechanical stripping. The difference between and A1g peaks and the position of the longitudinal acoustic mode changed considerably following oxygen plasma treatment. Atomic force microscopy was used to explore the changes of the structure, mechanical behavior, and surface potential of the MoS2 films induced by plasma treatment. Root mean square values were used to analyze the changes of surface roughness, adhesion, and surface potential of the MoS2 films induced by oxygen plasma treatment. The root mean square roughness of the films first increased and then decreased with increasing plasma treatment duration. The defect content of the MoS2 films was increased by oxygen plasma treatment and the surface potential decreased considerably. These finding could be important for producing two-dimensional dichalcogenide-based electrical and optoelectronic devices. |
| Databáze: | OpenAIRE |
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