Columnar structured amorphous carbon nitride films

Autor:	Nobuaki Kitazawa, Yoshihisa Watanabe, Shoji Nitta, Shunsuke Kikuchi, Masami Aono, Naoyuki Tamura
Rok vydání:	2010
Předmět:	Carbon film Materials science Amorphous carbon Electrical resistivity and conductivity Torr Analytical chemistry Nanotechnology Substrate (electronics) Graphite Nitride Condensed Matter Physics Amorphous solid
Zdroj:	physica status solidi c. 7:797-800
ISSN:	1610-1642 1862-6351
DOI:	10.1002/pssc.200982676
Popis:	Columnar structured amorphous carbon nitride films were deposited by reactive radio frequency magnetron sputtering from a graphite target in glow discharge plasma of nitrogen. The columnar structure was observed in all specimens of the amorphous carbon nitride (a-CNx) films deposited on substrates of crystalline Si and quartz glass within substrate temperatures between RT and 853 K in nitrogen gas pressure of 0.12 to 0.8 Torr. The average diameter of the columns obtained from SEM was found to be about 40 nm. The results of XRD and FE-TEM confirmed the columns were amorphous materials. However, the electrical properties reflected clearly the heterogeneous structure of a-CNx films, i.e., the resistivity in the vertical to a-CNx columns was lower as compared with that in the horizontal direction (© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0c2826f2fa769f0ffd0171e839eb0176 https://doi.org/10.1002/pssc.200982676 Zobrazit plný text záznamu Plný text