Simulation of Gas-Phase Nanoparticle Dynamics in the Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanostructures
| Autor: | Shuyan Xu, P.P. Rutkevych, R. Storer, Ken Ostrikov, Igor Denysenko |
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| Rok vydání: | 2004 |
| Předmět: |
Debye sheath
Materials science chemistry.chemical_element Nanoparticle Nanotechnology Substrate (electronics) Condensed Matter Physics Atomic and Molecular Physics and Optics symbols.namesake chemistry Chemical engineering Plasma-enhanced chemical vapor deposition symbols Deposition (phase transition) Inductively coupled plasma Carbon Plasma processing Mathematical Physics |
| Zdroj: | Physica Scripta. 70:322-325 |
| ISSN: | 1402-4896 0031-8949 |
| Popis: | The results of 1D simulation of nanoparticle dynamics in the areas adjacent to nanostructured carbon-based films exposed to chemically active complex plasma of CH4 + H2 + Ar gas mixtures are presented. The nanoparticle-loaded near-substrate (including sheath and presheath) areas of a low-frequency (0.5 MHz) inductively coupled plasma facility for the PECVD growth of the ordered carbon-based nanotip structures are considered. The conditions allowing one to predict the size of particles that can pass through the plasma sheath and softly land onto the surface are formulated. The possibility of soft nano-cluster deposition without any additional acceleration common for some existing nano-cluster deposition schemes is demonstrated. The effect of the substrate heating power and the average atomic mass of neutral species is studied numerically and verified experimentally. |
| Databáze: | OpenAIRE |
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