| Autor: |
Bob Barr, M. Moynihan, Corey O'connor, Jochen Rentsch, Scott Tiffany, Wolfgang Braun, Katrin Birmann, George Allardyce |
| Rok vydání: |
2010 |
| Předmět: |
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| Zdroj: |
2010 35th IEEE Photovoltaic Specialists Conference. |
| DOI: |
10.1109/pvsc.2010.5614629 |
| Popis: |
Potassium Hydroxide (KOH) and Isopropanol (IPA) are currently being used to texturize and reduce the reflectivity of mono crystalline (mono-c) silicon wafer surfaces during the manufacturing of solar cells. One concern with this process is that the IPA is volatile which can lead to high replenishment rates, poor process stability, and increased costs. The flammable nature of the IPA should also be highlighted which can lead to handling and safety concerns. The goal of this work was to develop an IPA free process that does not compromise texturing or cell performance while providing improved process control. A secondary goal was to develop a chemistry that would allow for in-line texturing of mono-crystalline substrates. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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