Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney
Autor: | Burhanuddin Yeop Majlis, Jumril Yunas, Azrul Azlan Hamzah, Kamarul 'Asyikin Mustafa |
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Rok vydání: | 2017 |
Předmět: |
Potassium hydroxide
Materials science Silicon 020209 energy technology industry and agriculture chemistry.chemical_element 020207 software engineering Nanotechnology 02 engineering and technology Surface finish Substrate (electronics) law.invention Nanopore chemistry.chemical_compound chemistry Chemical engineering Etching (microfabrication) law parasitic diseases 0202 electrical engineering electronic engineering information engineering Surface roughness Filtration |
Zdroj: | 2017 IEEE Regional Symposium on Micro and Nanoelectronics (RSM). |
DOI: | 10.1109/rsm.2017.8069130 |
Popis: | This paper reports square silicon nanopore filtration membrane fabrication on -oriented silicon substrate by employing potassium hydroxide (KOH) + isopropyl alcohol (IPA) wet etching. The aim of the study is to get a smooth membrane surface as the nanopore patterning base. A constant heated temperature of 80 °C employing double boil technique is used in both buffer oxide etching (BOE) and KOH etching steps to shorten time taken and get a better surface roughness. 10 minutes quick exposed nitride layer removal is achieved using the constant high temperature setting, while an add-on of 10 % IPA in KOH etchant aids in producing a uniform and smooth etched surface. A smooth surface roughness is required in patterning uniform filtration nanopores later on, and applied as a filtration membrane in artificial kidney. |
Databáze: | OpenAIRE |
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