Characteristics of TiN/W 2 N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers
| Autor: | Chun-Ta Ho, Wan-Yu Wu, Wei-Chih Chen, Tz-Heng Chiou, Pin-Hung Chen, Chi-Lung Chang |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Metallurgy Analytical chemistry Pulsed DC chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces General Chemistry Substrate (electronics) Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Microstructure 01 natural sciences Surfaces Coatings and Films chemistry Sputtering 0103 physical sciences Cavity magnetron Materials Chemistry 0210 nano-technology Tin Deposition (chemistry) |
| Zdroj: | Surface and Coatings Technology. 303:25-31 |
| ISSN: | 0257-8972 |
| Popis: | A dc magnetron sputter (dcMS) deposition and a pulsed dcMS deposition methods were used respectively to deposit TiN and W 2 N coatings in a mixture gas of Ar and N 2 . Single layer TiN and W 2 N were first obtained to determine the deposition condition for the multilayers. TiN/W 2 N multilayers were deposited and the effects of the substrate rotation speed and the N 2 /Ar concentration on microstructure, hardness, and the corrosion property have been examined. It was observed that the multilayer TiN/W 2 N adheres well onto the substrate. In addition, the hardness and the anti-corrosion property of the multilayer are also better than that of the single-layer coatings. |
| Databáze: | OpenAIRE |
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