| Popis: |
A new method for microlens profile design was developed based on the analysis to the main parameters of microlens array, including micro profile formation, the numerical aperture ( NA ), the maximum sag depth for the refractive lens and the minimum zones width for the diffractive lens. With the relationships among the parameters, the microlens array in different profile can be determined effectively. The moving mask method[1] is used to realize the required profiles, an unique photolithography system have been built for implementing the mask moving exposure in both X and Y directions for the creation of microlens array. By modifying the binary moving mask, optimizing the photosensitive materials and the processing technique, the microlens profile error can be controlled in the range of 0.4µm~3µm depending on effective reliefdepth of the microlens. In our method, both diffractive and refractive microlens array with larger NA and higher fill factor can be fabricated for satisfying a plenty of purposes. |
