STRUCTURE AND CHARACTERISTICS OF C3N4 THIN FILMS

Autor: Fu Dejun, Fan Xiangjun, He Meng-Bing, Wu Da-Wei, Luo Hai-lin, Zhang Zhihong, Guo Huaixi
Rok vydání: 1997
Předmět:
Zdroj: Acta Physica Sinica. 46:530
ISSN: 1000-3290
Popis: Nitride carbon thin films have been deposited by plasma-enhanced chemical vapor phase deposition. The results of transmission-electron diffraction indicated that films have polycrystal structures. Carbon and nitrogen atoms binding energies and the nitrogen content of the-films are measured out by X-ray photoelectron spectroscopy.The Fourier transform infrared spectrum show that there is no graphite phase in the films,and the Vickers hardness of the films vary from 29.2 to 50.0GPa.
Databáze: OpenAIRE