Influence of Laser Pulse Duration on N2+, N+, and N2+ Formation Processes in the Nitrogen Molecule

Autor:	Kenji Kumazaki, Uichi Kubo, Hiroaki Matsue, Takeyoshi Nakayama, Takaomi Matsutani
Rok vydání:	1998
Předmět:	Materials science business.industry chemistry.chemical_element Substrate (electronics) Nitride Pulsed laser deposition chemistry Transmittance Optoelectronics Tin business Sheet resistance Visible spectrum Transparent conducting film
Zdroj:	The Review of Laser Engineering. 26:563-564
ISSN:	1349-6603 0387-0200
Popis:	A titanium nitride film for a transparent conductor was formed on a SiO2 substrate at room temperature by using a pulsed laser deposition method. The ablation is promoted from a Ti target with KrF excimer laser irradiation in an N2 ambient gas. The structure of the film measured by using XRD was mainly TiN polycrystalline. In the case of the film thickness thinner than the wavelength of visible light, the transmittance and sheet resistance of the films were in the range of 74-47 % and 1000-70Ω/_??_, respectively.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0b56a2d1d955cf4e4f694ca6207153ae https://doi.org/10.2184/lsj.26.563 Zobrazit plný text záznamu