Plasma polymerization of tetrafluoroethylene
| Autor: | K. Nakajima, Alexis T. Bell, M. M. Millard, Mitchel Shen |
|---|---|
| Rok vydání: | 1979 |
| Předmět: |
chemistry.chemical_classification
Materials science Polymers and Plastics Kinetics General Chemistry Polymer Spectral line Plasma polymerization Surfaces Coatings and Films chemistry.chemical_compound chemistry Chemical engineering Functional group Polymer chemistry Materials Chemistry Continuous wave Tetrafluoroethylene Deposition (chemistry) |
| Zdroj: | Journal of Applied Polymer Science. 23:2627-2637 |
| ISSN: | 1097-4628 0021-8995 |
| DOI: | 10.1002/app.1979.070230908 |
| Popis: | The plasma polymerization of C2F4 was carried out in both continuous wave and pulsed rf discharges to establish the effects of reaction conditions on the kinetics of polymer deposition and the polymer structure. ESCA spectra of the polymer show evidence for CF3, CF2, and CH2 groups. Under conditions favoring low deposition rates, the dominant functional group is CF2. At higher deposition rates the concentration of CF2 groups is reduced and a more crosslinked polymer is produced. Both polymer deposition rates and polymer structures were essentially identical when using continuous wave and pulsed rf discharges. |
| Databáze: | OpenAIRE |
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