Fabrication of ultra-clean copper surface to minimize field emission dark currents

Autor: Masahiro Yamamoto, Masakazu Yoshioka, F. Furuta, Shoji Okumi, Kazuaki Togawa, T. Nishitani, S. Kurahashi, J. Watanabe, Tsutomu Nakanishi, Hisashi Kobayakawa, K. Asano, C. Suzuki, K. Wada, T. Gotou, Hiroshi Matsumoto
Rok vydání: 2001
Předmět:
Zdroj: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 462:337-348
ISSN: 0168-9002
Popis: The current from copper electrodes treated by four different types of surface cleaning procedures was measured under DC high field gradient condition. The best results were obtained by using the electrode rinsed with ultra-pure water after diamond turning. A field gradient of 47 MV/m was achieved with dark current at the level of 1 nA, and the microscopic field enhancement factor was estimated to be a very low value of 56. The dark current from this electrode was dependent only on the field gradient at the cathode and not affected by the total voltage applied to the gap. In this case the surface would be covered by a Cu2O layer, which creates few secondary ions by the electron bombardment. On the other hand, a large total voltage effect and a large vacuum increase were observed for the electro-polished electrode. Cu(OH)2, which would be formed at the copper surface during the electro-polishing process, would emit H2O molecules during the electron bombardment.
Databáze: OpenAIRE