Effect of the deposition gas pressure on the structure and mechanical stability of sputtered amorphous carbon nitride films
Autor: | Michael Lejeune, S. Charvet, M. Guedda, S. Peponas, M. Benlahsen |
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Rok vydání: | 2012 |
Předmět: |
Materials science
Analytical chemistry Surfaces and Interfaces General Chemistry Sputter deposition Nitride Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound Carbon film Amorphous carbon chemistry Materials Chemistry Deposition (phase transition) Graphite Composite material Thin film Carbon nitride |
Zdroj: | Surface and Coatings Technology. 212:229-233 |
ISSN: | 0257-8972 |
Popis: | We present in this study spectroscopic investigations of amorphous carbon nitride thin films (a-CNx) deposited on Si substrate by radio-frequency magnetron sputtering of a graphite target in Ar/N2 gas mixture, under different deposition gas pressure. The properties of films were determined using atomic force microscopy (AFM), Fourier Transform Infrared measurements, transmission spectroscopy and intrinsic stress measurements. A limiting effect of the terminating bonds and their contamination by water has been examined in relation with optoelectronical and mechanical properties of the films. The appearance of the telephone-cord buckling as an interfacial failure mode has been elucidated and the evolution of their morphological characteristics has been studied in relation with the deposition conditions and the resulting microstructure. |
Databáze: | OpenAIRE |
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