Effect of the deposition gas pressure on the structure and mechanical stability of sputtered amorphous carbon nitride films
| Autor: | Michael Lejeune, S. Charvet, M. Guedda, S. Peponas, M. Benlahsen |
|---|---|
| Rok vydání: | 2012 |
| Předmět: |
Materials science
Analytical chemistry Surfaces and Interfaces General Chemistry Sputter deposition Nitride Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound Carbon film Amorphous carbon chemistry Materials Chemistry Deposition (phase transition) Graphite Composite material Thin film Carbon nitride |
| Zdroj: | Surface and Coatings Technology. 212:229-233 |
| ISSN: | 0257-8972 |
| Popis: | We present in this study spectroscopic investigations of amorphous carbon nitride thin films (a-CNx) deposited on Si substrate by radio-frequency magnetron sputtering of a graphite target in Ar/N2 gas mixture, under different deposition gas pressure. The properties of films were determined using atomic force microscopy (AFM), Fourier Transform Infrared measurements, transmission spectroscopy and intrinsic stress measurements. A limiting effect of the terminating bonds and their contamination by water has been examined in relation with optoelectronical and mechanical properties of the films. The appearance of the telephone-cord buckling as an interfacial failure mode has been elucidated and the evolution of their morphological characteristics has been studied in relation with the deposition conditions and the resulting microstructure. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect