Formation of buried TiN in glass by ion implantation to reduce solar load

Autor:	John Bomback, Gary S. Was, Robert Eugene Benoit, V. Rotberg, Dennis R. Platts
Rok vydání:	1996
Předmět:	Soda-lime glass Ion implantation X-ray photoelectron spectroscopy chemistry Infrared Transmission electron microscopy Analytical chemistry General Physics and Astronomy chemistry.chemical_element Selected area diffraction Rutherford backscattering spectrometry Tin
Zdroj:	Journal of Applied Physics. 80:2768-2773
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.363194
Popis:	Ti and N were implanted into soda lime glass to doses up to 4.5×1017 cm−2 to reduce solar load and infrared transmission. Analysis of the Ti+N implant distributions by Rutherford backscattering spectrometry and x‐ray photoelectron spectroscopy (XPS) revealed profiles which closely followed each other as designed by the selection of implant energies. XPS, x‐ray diffraction, and selected area electron diffraction in transmission electron microscopy also confirmed the existence of a crystalline B1‐type, cubic TiN layer, 140 nm wide, at doses greater than 9×1016 cm−2. Optical measurements showed that the fraction of infrared radiation reflected was increased by almost a factor of 4 compared to an increase of 1.8 in the visible region. The percentage of the total solar energy rejected reached 80% at the highest dose, indicating that the buried TiN layer is highly effective in reducing solar energy transmission.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0a77883d77989375b5e3bdded996c8cc https://doi.org/10.1063/1.363194 Zobrazit plný text záznamu