| Autor: |
T. I. Cox, V. G. I. Deshmukh, D. A. O. Hope, A. J. Hydes |
| Rok vydání: |
1991 |
| Předmět: |
|
| Zdroj: |
Advanced Techniques for Integrated Circuit Processing. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.48929 |
| Popis: |
Initial results on the application of adaptive network concepts to the problem of dry etching control are given in this paper. The role of off-line experimentation and analysis in defining a suitable parametric model for a dry etching process is first described. Alternative methods of parameter estimation are compared. An embryonic on-line regulator is then outlined. This has been used to control a parameter of interest namely the bias at the wafered electrode DCBW of a reactive ion etching (RIE) station. Successful tracking of a randomized trajectory for DCBW is demonstrated.© (1991) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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