Popis: |
In this paper the interface trap densities (Dit) of 4H and 6H-SiC MOSFETs in the subthreshold region have been studied. Interface trap densities in this region were extracted as a function of trap energy (ET) from the transfer characteristics. We show these interface trap densities increase exponentially approaching the onset of strong inversion for both polytypes, and Dit(ET) is higher in 4H than in 6H through the subthreshold region. These results are consistent with previous reports [1] , [2] , [3] , [4] , [5] , [6] . |