Modeling of the Reaction for Low Pressure Chemical Vapor Deposition of Silicon Dioxide
| Autor: | Arthur J. Learn |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Hybrid physical-chemical vapor deposition
Renewable Energy Sustainability and the Environment Silicon dioxide Vapor pressure Chemical vapor deposition Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound chemistry Chemical engineering Materials Chemistry Electrochemistry Physical chemistry |
| Zdroj: | Journal of The Electrochemical Society. 132:390-393 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2113848 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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