Effects of pressure on metal atom transport and plasma properties during arc ion plating of TiAlN
| Autor: | Yun Kon Joo, Chan Gyu Lee, Tong Yul Cho, Jae Hong Yoon, Jun Qing Lu |
|---|---|
| Rok vydání: | 2007 |
| Předmět: |
Materials science
Ion plating Metals and Alloys Analytical chemistry chemistry.chemical_element Plasma Condensed Matter Physics Condensed Matter::Materials Science Ion beam deposition chemistry Physics::Plasma Physics Mechanics of Materials Aluminium Physical vapor deposition Cathodic arc deposition Materials Chemistry Plasma processing Titanium |
| Zdroj: | Metals and Materials International. 13:123-128 |
| ISSN: | 2005-4149 1598-9623 |
| DOI: | 10.1007/bf03027562 |
| Popis: | Arc ion plating is used to deposit titanium and aluminum nitrides as wear and corrosion resistant layers on the surface of steel tools. In this study, the deposition efficiency for the evaporated metal atoms in arc ion plating was obtained by a view factor solution for the collisionless transport and a diffusion solution for the continuum transport. In the diffusion solution, the deposition efficiency decreases rapidly with pressure. A global nitrogen plasma model with a set of simplified plasma chemistry was used to investigate the plasma properties at pressures ranging from several mTorr up to 50 mTorr. The results indicate that the electron temperature, the ratio of electric field to gas density, and the nitrogen atom density all decrease with increasing pressure, while the plasma density increases. Based on the combined considerations of deposition efficiency and effective ion bombardment of the films on the substrate, an operating pressure range from 20 to 30 mTorr is recommended for highly efficient (Ti, Al)N coating during film deposition. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink