Creation of Submicrometer Structures Using Polymeric Nanoparticle Layers and Photolithography
| Autor: | Marc D. Porter, Andrew D. Pris |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Materials science
Fabrication Mechanical Engineering Nanoparticle Bioengineering Nanotechnology General Chemistry Condensed Matter Physics Polymeric nanoparticles Characterization (materials science) law.invention law Thermal Deposition (phase transition) General Materials Science Photomask Photolithography |
| Zdroj: | Nano Letters. 2:1087-1091 |
| ISSN: | 1530-6992 1530-6984 |
| Popis: | This letter describes a novel route for the facile construction of mechanically robust, submicron architectures. The method couples the layer-by-layer deposition of charged polymeric nanoparticles with photopatterning and thermal processing. The merits of the method are demonstrated by the fabrication and microscopic characterization of massively dense (∼650 000 wells/cm2), ultrasmall volume (3−15 fL) well arrays. The well depth is controlled by the number of nanoparticle layers, with well depths as low as ∼4 nm obtained. The lateral dimensions of the wells, which were several microns, are defined by the photomask. Thermal processing not only further enhances the structural stability of the array but also dramatically reduces the depth of the wells. Potential applications of this preparative strategy are briefly discussed. |
| Databáze: | OpenAIRE |
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