Microstructuring GaAs Using Reverse-Patterning Lithography: Implications for Transistors and Solar Cells
| Autor: | T. Randall Lee, Venkat Selvamanickam, Devendra Khatiwada, Sahil Sharma, Maria D. Marquez, Tianlang Yu |
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| Rok vydání: | 2020 |
| Předmět: |
Materials science
business.industry Transistor Self-assembled monolayer Electronic Optical and Magnetic Materials Gallium arsenide law.invention chemistry.chemical_compound chemistry law Microcontact printing Materials Chemistry Electrochemistry Deposition (phase transition) Optoelectronics business Lithography |
| Zdroj: | ACS Applied Electronic Materials. 3:170-175 |
| ISSN: | 2637-6113 |
| DOI: | 10.1021/acsaelm.0c00876 |
| Popis: | This paper introduces reverse patterning lithography (RPL), which combines microcontact printing (μCP) of a custom-designed fluorinated adsorbate on gallium arsenide (GaAs) and the deposition of a ... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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