Elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy
| Autor: | Yu. M. Rumyantsev, E. A. Maximovskii, N. I. Fainer, B. M. Ayupov |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Silicon Scanning electron microscope Analytical chemistry Energy-dispersive X-ray spectroscopy chemistry.chemical_element Infrared spectroscopy Synchrotron radiation Substrate (electronics) Inorganic Chemistry Condensed Matter::Materials Science X-ray photoelectron spectroscopy chemistry Materials Chemistry Physical and Theoretical Chemistry Thin film |
| Zdroj: | Journal of Structural Chemistry. 51:179-185 |
| ISSN: | 1573-8779 0022-4766 |
| DOI: | 10.1007/s10947-010-0210-0 |
| Popis: | Specific features of elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy (EDS) are considered. The films were preliminarily examined by IR spectroscopy, X-ray photoelectron spectroscopy (XPS), scanning electron (SEM) and atomic force microscopy (AFM), and X-ray diffraction analysis using synchrotron radiation (SR-XRD) to acquire data on their chemical and phase composition, crystalline structure and surface morphology. The effect of film thickness, substrate material and electron beam energy on the results of energy dispersive analysis was investigated. |
| Databáze: | OpenAIRE |
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