Aerial Image Measurement System for 157 nm Lithography

Autor:	Iwao Higashikawa, Takashi Yasui, Christof Matthias Dr. Schilz, Jan-Peter Urbach, Klaus Dr. Eisner, Peter Kuschnerus, Thomas Engel, Axel Zibold
Rok vydání:	2002
Předmět:	Materials science Optics business.industry Extreme ultraviolet lithography Multiple patterning Process window X-ray lithography business Lithography Next-generation lithography Aerial image Immersion lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.467353
Popis:	The worldwide first Aerial Image Measurement System (AIMS) for 157 nm lithography has been used to measure binary chrome and attenuated phase shift masks at 157 nm wavelength. The AIMS measurements were done for line structures from 200 nm up to 400 nm and for 500 nm contacts. Through focus series have been conducted to calculate the process windows for various structures and feature sizes.
Databáze:	OpenAIRE
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