Initial activation behavior of boron at low temperatures with implantation doses below the amorphization threshold

Autor:	Jui-Chang Lin, Ruey-Dar Chang, Bo-Wen Lee
Rok vydání:	2020
Předmět:	Ion implantation Materials science Physics and Astronomy (miscellaneous) chemistry Annealing (metallurgy) General Engineering Analytical chemistry General Physics and Astronomy chemistry.chemical_element Boron
Zdroj:	Japanese Journal of Applied Physics. 59:096501
ISSN:	1347-4065 0021-4922
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::09744820462dfd369af94f9f6ad318af https://doi.org/10.35848/1347-4065/aba9a6 Zobrazit plný text záznamu