| Popis: |
The analysis of liquids to obtain information about semiconductor materials is known in the industry as “wet chemistry” and has been used since the beginning of the production of IC’s. However, the analytical procedures never gained any significant attention until the mid 70’s when the absolute measurement of phosphorus in PSG films by wet chemical analysis was incorporated by several industrial labs as the standard method of analysis. Today, over 120 different procedures are used to gain specific information about incoming and processed materials used in the industry. These procedures cover ultra pure water, chemicals, thin films, and wafer cleanliness. Furthermore, they are used to evaluate the cleanliness of reactors, cleanrooms, and components of all kinds that are used in cleanrooms, wet benches and reactors. This paper will cover a total look at the applications of wet chemical processes and the usefulness of the data obtained from these analytical techniques. The paper will cover not only those tests that one would expect to be done by wet processes such as the analysis of metals in chemicals, but will also cover many unusual applications of wet chemical analysis such as their usefulness in evaluating products from a variety of reactors. Included in this part of the presentation will be a unique application to determine ion implantation contaminants and recent advances for analyzing 300mm wafers without breaking them and the analysis of contamination metals in copper thin films. Actual data will be provided for each of the analytical techniques presented. |
