Several Strategies for Aluminum Metal Gate Chemical Mechanical Planarization Scratch Reduction

Autor:	Q.X. Hong, P. L. Zhu, F. Luo, D. C. Liu, J. Zhang, H. F. Zhou, J. X Fang, Y. Zhang
Rok vydání:	2022
Zdroj:	2022 China Semiconductor Technology International Conference (CSTIC).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0932e2be046238179db54ae5fa076739 https://doi.org/10.1109/cstic55103.2022.9856733 Zobrazit plný text záznamu