Production high-energy ion implanters with milliampere beam capabilities

Autor:	B. Libby, A.S. Denholm, Gordon Kenneth Simcox, P. Boisseau, H.F. Glavish, A. Dart
Rok vydání:	1989
Předmět:	Milliampere Nuclear and High Energy Physics Range (particle radiation) Materials science business.industry Analytical chemistry Injector Linear particle accelerator law.invention Ion Acceleration Optics Ion implantation law business Instrumentation Beam (structure)
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :591-595
ISSN:	0168-583X
DOI:	10.1016/0168-583x(89)90254-1
Popis:	The high degree of stability and beam purity characteristic of rf acceleration techniques have been well demonstrated with the Eaton NV-1000 ion implanter. The series has been extended to take fuller advantage of the high current capability of the technique. The NV-1002 will provide milliampere beams to energies of 2 MeV over a wide range of ion masses. In addition to the higher current capability, the new series will be smaller in size and incorporate the most recent Eaton end-station technology. The Eaton Advanced control system will be used in the automation of source, injector, linac and robotic end station.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::08e055f57f4b99a3715a51e4aa7fd8b9 https://doi.org/10.1016/0168-583x(89)90254-1 Zobrazit plný text záznamu