Conduction mechanism of sputtered BaTiO3 film on Ni substrate

Autor:	Zhigang Li, James F. Ryley, Lijie Bao, Charles Wilker, Lei Zhang, Robert L. Opila, Damien Francis Reardon
Rok vydání:	2009
Předmět:	Diffraction Materials science business.industry Analytical chemistry General Physics and Astronomy Recrystallization (metallurgy) Sputter deposition Thermal conduction law.invention Capacitor law Transmission electron microscopy Optoelectronics Electrical measurements Thin film business
Zdroj:	Journal of Applied Physics. 106:114114
ISSN:	1089-7550 0021-8979
Popis:	BaTiO3 (BTO) thin film capacitors were deposited on Ni substrate using rf magnetron sputtering. Microstructural studies by x-ray diffraction and transmission electron microscopy reveal that the as-grown BTO films have the columnar structure and the good interface structure. Postdeposition anneal results in the recrystallization of BTO films. The electrical measurements exhibit that the BTO films have high capacitance densities and low leakage currents.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::08ac465088e39873e830aa20ddfcac73 https://doi.org/10.1063/1.3254194 Zobrazit plný text záznamu