Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?
| Autor: | Araceli Gutierrez-Llorente, Arthur R. Woll, M. C. Sullivan, Eli R. Adler, Joel D. Brock, Howie Joress, Matthew J. Ward |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Reflection high-energy electron diffraction
Materials science Physics and Astronomy (miscellaneous) Annealing (metallurgy) Oscillation 02 engineering and technology 021001 nanoscience & nanotechnology Laser 01 natural sciences Pulsed laser deposition law.invention X-ray reflectivity Condensed Matter::Materials Science Electron diffraction law 0103 physical sciences Monolayer Atomic physics 010306 general physics 0210 nano-technology |
| Zdroj: | Applied Physics Letters. 106:031604 |
| ISSN: | 1077-3118 0003-6951 |
| Popis: | During layer-by-layer homoepitaxial growth, both the Reflection High-Energy Electron Diffraction (RHEED) intensity and the x-ray reflection intensity will oscillate, and each complete oscillation indicates the addition of one monolayer of material. However, it is well documented, but not well understood, that the phase of the RHEED oscillations is not constant and thus the maxima in the RHEED intensity oscillations do not necessarily occur at the completion of a layer. We demonstrate this using simultaneous in situ x-ray reflectivity and RHEED during layer-by-layer growth of SrTiO$_3$. We show that we can control the RHEED oscillation phase by changing the pre-growth substrate annealing conditions, changing the RHEED oscillation phase by nearly 180$^\circ$. In addition, during growth via pulsed laser deposition, the exponential relaxation times between each laser pulse can be used to determine when a layer is complete, independent of the phase of the RHEED oscillation. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|