A novel formulated developer for negative-tone imaging with EUV exposure to improve chemical stochastic
| Autor: | Keiyu Ou, Naohiro Tango, Nishiki Fujimaki, Kazuhiro Marumo, Nobuhiro Hiura, Satomi Takahashi, Toru Fujimori |
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| Rok vydání: | 2023 |
| Zdroj: | Advances in Patterning Materials and Processes XL. |
| DOI: | 10.1117/12.2657421 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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